Name: 8/6/4/2Inch LPCVD Oksydacyjny Piec pełna automatyzacja Niska kontrola tlenu Depozycja cienkiej folii
Uploaded: 2026-03-10CDT00:13:12-05:00
Duration: 46 s
Description: Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

Czat Skontaktuj się z nami

8/6/4/2Inch LPCVD Oksydacyjny Piec pełna automatyzacja Niska kontrola tlenu Depozycja cienkiej folii

Inne filmy

April 27, 2025

Czat Skontaktuj się z nami

Opis wideo:

Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

Powiązane wideo