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Copper-Plated Monocrystalline Silicon Wafer for MEMS manufacturing Sensor electrode fabrication

Copper-Plated Monocrystalline Silicon Wafer for MEMS manufacturing Sensor electrode fabrication

Nazwa marki: ZMSH
MOQ: 2
Cena £: by case
Szczegóły opakowania: niestandardowe kartony
Warunki płatności: T/T
Szczegółowe informacje
Miejsce pochodzenia:
Chiny
Materiał podłoża:
Monokrystaliczny wafel krzemowy
Orientacja kryształowa:
<100>, <111> lub dostosowane
Rozmiar wafla:
2 cale, 4 cale, 6 cali, 8 cali lub niestandardowe
Grubość płytki:
Możliwość dostosowania
Rodzaj nakładki:
Jednostronne, dwustronne lub częściowe miedziowanie
Grubość miedzi:
Możliwość dostosowania
Możliwość Supply:
W sprawie
Opis produktu

Copper-Plated Monocrystalline Silicon Wafer

High Adhesion, Excellent Conductivity, and Customizable Metallization Solutions

Product Overview

Copper-plated monocrystalline silicon wafers are manufactured by depositing a uniform copper layer onto high-quality single crystal silicon substrates through precision surface treatment and metallization processes. By combining the excellent mechanical and electrical properties of monocrystalline silicon with the superior electrical conductivity, thermal conductivity, and solderability of copper, this product is widely used in semiconductor packaging, MEMS fabrication, sensors, power devices, wafer-level interconnection, and R&D applications.

 

We offer flexible customization options including single-side copper plating, double-side copper plating, localized copper coating, and tailored wafer specifications to meet both prototype development and volume production requirements.

 

Copper-Plated Monocrystalline Silicon Wafer for MEMS manufacturing Sensor electrode fabrication 0

Key Features

Excellent Electrical and Thermal Conductivity

The copper layer provides outstanding electrical and thermal performance, helping improve signal transmission, current carrying capability, and heat dissipation in advanced electronic applications.

Uniform and Dense Copper Coating

With controlled plating technology, the copper layer is even, compact, and stable across the wafer surface, supporting better consistency in downstream manufacturing processes.

Strong Adhesion to Silicon Substrate

Through optimized surface preparation and interface treatment, the copper coating achieves strong adhesion to the monocrystalline silicon wafer, reducing the risk of peeling or delamination during cutting, bonding, soldering, or packaging.

Compatible with Various Post-Processing Steps

The product is suitable for subsequent processes such as photolithography, etching, dicing, welding, bonding, and packaging, making it a reliable base material for microfabrication and device integration.

Customizable for Different Applications

We support custom wafer diameter, thickness, crystal orientation, resistivity, plating thickness, and plating area according to customer requirements.

 

Copper-Plated Monocrystalline Silicon Wafer for MEMS manufacturing Sensor electrode fabrication 1

Typical Applications

  • Semiconductor device metallization
  • Power device conductive and heat-spreading layers
  • MEMS manufacturing
  • Sensor electrode fabrication
  • Wafer-level packaging and interconnection
  • Surface engineering and laboratory research
  • Electronic material development

Available Specifications

Copper-Plated Monocrystalline Silicon Wafer for MEMS manufacturing Sensor electrode fabrication 2

Item Description
Substrate Material Monocrystalline Silicon Wafer
Crystal Orientation <100>, <111>, or customized
Wafer Size 2 inch, 4 inch, 6 inch, 8 inch, or customized
Wafer Thickness Customizable
Plating Type Single-side, double-side, or partial copper plating
Copper Thickness Customizable
Surface Finish Polished, lapped, or customized
Resistivity Customizable
Application Support R&D samples and mass production

 

Custom Services

To meet the needs of different fabrication processes and device structures, we provide:

  • Custom wafer dimensions
  • Custom copper thickness
  • Single-side or double-side plating
  • Patterned or selective copper plating
  • Small-batch prototyping
  • Bulk production support

Why Choose Us

We specialize in silicon-based material processing and surface metallization solutions. With stable process control, strict quality standards, and flexible customization capabilities, we help customers achieve reliable performance in both research and industrial manufacturing environments.

 

Whether you need sample evaluation, pilot production, or large-scale supply, we can provide a copper-plated monocrystalline silicon wafer solution tailored to your technical requirements.

 

FAQ – Copper-Plated Monocrystalline Silicon Wafer

1. What is a copper-plated monocrystalline silicon wafer?

A copper-plated monocrystalline silicon wafer is a single crystal silicon substrate coated with a copper layer through a surface metallization process. It combines the excellent structural and electrical properties of monocrystalline silicon with the high electrical and thermal conductivity of copper.

2. What are the main applications of copper-plated silicon wafers?

These wafers are commonly used in semiconductor packaging, MEMS fabrication, sensor manufacturing, power device structures, wafer-level interconnection, electrode preparation, and research applications.

3. Do you offer single-side and double-side copper plating?

Yes. We can provide single-side copper plating, double-side copper plating, and partial or selective copper plating depending on your application requirements.